Utilising transparent materials for devices such as system interfaces, necessitates the need to be able to apply the contact material to the desired surface extremely uniformly. Similarly creating solid state device contacts demands the ability to efficiently apply graphene to the target device surfaces.
Paragraf’s graphene production technique includes the ability to form graphene directly onto semiconductor material surfaces, and transparent crystalline substrates. This capability can deliver full coverage of the target material with either pristine, functionalised or mutli-layer graphene, resulting in a surface with properties designed for the final product application. In addition, the ability to provide graphene directly onto semiconductor device materials and indeed heterostructures removes the need for several downstream processing requirements, increasing production throughput while reducing cost.
Possibly most importantly, the potential to replace conventional, rare, toxic contacting materials with a simple carbon alternative is hugely beneficial for the environment and global population alike.